Abstract
A new design of carbon source using a S-shaped glassy carbon filament for p-doping and carbon deposition is presented. Due to the higher resistivity of the glassy carbon, lower current is needed to produce the same flux as in a source based on pyrolytic graphite filament. The source design is very compact and the use of water cooling is not mandatory. The results and simulations of the new design show a higher flux than the previously reported glassy carbon based source while avoiding hot spots that can cause an early filament degradation. Hole mobility vs doping level relation data on p-doped GaAs layers grown by molecular beam epitaxy using this new carbon source are shown.With this new C source GaAs (001) surface morphology flatness is preserved after depositing C, showing a reduced substrate heating radiation essential for operate in III-V solid source molecular beam epitaxy (MBE) systems.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
