Optimisation of free-abrasive assisted lapping process with vitrified bonded diamond plates for sapphire substrates

Abstract

To improve the processing performance of vitrified bonded diamond fixed-abrasive lapping plates for processing sapphire substrates, a free-abrasive was added to the lapping slurry to enhance the self-dressing ability of the lapping plate to achieve efficient and high-quality processing of sapphire substrates. The processing effectiveness and mechanism of a free-abrasive assisted fixed-abrasive lapping plates (FAAFALP) lapping process for sapphire substrates were analysed and revealed via a single-factor experiment. To optimise the lapping process of the FAAFALP of sapphire substrates with good overall performance (high material removal rate (MRR), minor surface roughness (Ra) and big lapping plate wear ratio (η)), the effects and the optimal parameters combination of the lapping pressure, lapping speed and free-abrasive concentration on MRR, Ra and η of lapping-processed sapphire substrates were investigated using orthogonal experiments. Furthermore, the experimental results were combined with process parameters to establish a regression model. The multi-evaluation index optimisation problem was transformed into a single-index optimisation problem via the grey relational analysis (GRA) to evaluate each parameter's performance comprehensively. The results revealed that an MRR increased by 22.2 % to 2.48 μm/min, the smallest surface roughness Ra of 0.141 μm, and the lapping plate wear ratio η relatively increased to 14.88 was obtained when a free-abrasive of SiO2 with a particle size of 14 μm was added into lapping slurry. Compared with no free-abrasive lapping process, free-abrasive can significantly improve the lapping plate's self-dressing ability and enhance the sapphire substrates' processing effect. The lapping speed, lapping pressure and free-abrasive concentration had different influence degrees on MRR, Ra and η. The established regression equations predicted the response values of MRR, Ra and η to be 99.87 %, 99.06 % and 98.59 %, respectively, and the relative errors between the predicted and actual measured values were <12 %. With increased lapping speed, MRR initially decreased but subsequently increased, and Ra and η gradually decreased. MRR and η continuously increased with increased lapping pressure, whereas Ra decreased. With increased free-abrasive concentration, MRR, Ra and η initially increased but subsequently decreased. Comparing the optimised results obtained by intuitive analysis, the parameters optimised via the GRA were used to obtain sapphire substrates lapping with an MRR of 3.81 μm/min, Ra of 0.133 μm and η of 20.4, and the overall lapping performance was better 42.92 %, 102.90 % and 43.60 % than that of intuitive analysis for MRR, Ra and η. Therefore, combining orthogonal experiments and GRA can provide new ideas for optimising the FAAFALP lapping process for sapphire substrates.