Optimal Preparation and Characterization of Sputtered Y<sub>2</sub>O<sub>3</sub> Films on Sapphire Substrates

Abstract

Normal 0 7.8 磅 0 2 false false false MicrosoftInternetExplorer4 It is necessary to prepare compressive films on sapphire window for preventing its high-temperature failure. In this study, the yttrium oxide (Y2O3) thin films were deposited on the sapphire substrates by RF reactive magnetron sputtering with varying sputtering pressure. The as-deposited Y2O3films were also annealed. The composition, structure, refractive index and mechanical properties of the films were systematically analyzed by XPS, XRD, ellipsometry and nanoindention method, respectively. The influences of sputtering pressure on the deposition velocity and the refractive index were investigated. It can obtain desirable Y2O3thin films for the preparation conditions (sputtering pressure: 10Pa, substrate temperature: 500°C, RF power: 200W) after annealing in O2at 500°C for 1h. The refractive index and hardness both have the maximum value (1.8337 and 3.98 GPa), respectively. The elastic module has the minimum value (109.24 GPa). It is promising for the Y2O3film as the underlayer of protective coating of sapphire windows. <object classid="clsid:38481807-CA0E-42D2-BF39-B33AF135CC4D" id=ieooui> st1\:*{behavior:url(#ieooui) } /* Style Definitions */ table.MsoNormalTable {mso-style-name:普通表格; mso-tstyle-rowband-size:0; mso-tstyle-colband-size:0; mso-style-noshow:yes; mso-style-parent:""; mso-padding-alt:0pt 5.4pt 0pt 5.4pt; mso-para-margin:0pt; mso-para-margin-bottom:.0001pt; mso-pagination:widow-orphan; font-size:10.0pt; font-family:"Times New Roman"; mso-fareast-font-family:"Times New Roman"; mso-ansi-language:#0400; mso-fareast-language:#0400; mso-bidi-language:#0400;}