Optimal Feature Selection for Defect Classification in Semiconductor Wafers

Abstract

Semiconductors are essential components in many electronic devices. Because wafers are produced quickly and in large quantities, defects occur that adversely affect semiconductor properties. This makes it necessary to install powerful and robust inspection systems which use artificial intelligence techniques in the early stages of the manufacturing chain in order to detect and classify those defects. This paper proposes a method for defect detection and classification on images of semiconductor wafer materials obtained by means of a scanning electron microscope based in the following stages: (i) use of computer vision techniques to isolate the defect from the background; (ii) use of several descriptors based on shape, size, texture, histogram, and key-points to create a feature vector for the characterization of the defect; (iii) application of an exhaustive search as a feature selection method to determine the optimal subset of feature descriptors; and (iv) evaluation of the feature descriptors by using a support vector machine classifier providing the optimal set with highest F1-score metrics. Finally, the effectiveness of the proposed approach is compared with five popular feature selection methods, reporting better classification results than the latter.