Abstract
In this paper, we employed a quadruple-layer antireflection coating structure with Al2O3 deposited by DC reactive magnetron sputtering and SiO2 deposited by PECVD (plasma enhanced chemical vapor) deposition as the bottom layer, and proposed an optical optimization program for quadruple-layer antireflection coatings to obtain the structure parameters. In the experiment, two types of optimization quadruple-layer antireflection coatings and typical SiNx:H double-layer antireflection coatings were deposited on the crystalline silicon solar cells. The reflectance of the silicon solar cell with quadruple-layer antireflection coatings was lower than that of the solar cell with SiNx:H double-layer antireflection coatings. These results demonstrated the possibility of substituting quadruple-layer antireflection coatings for double-layer antireflection coatings, as well as the feasibility of the application in photovoltaic.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
