Abstract
285 nm stimulated emission (SE) is demonstrated at room temperature from optically-pumped AlGaN multiple quantum wells (MQWs) deposited between a Si-doped AlGaN current spreading layer and a 25 nm Mg-doped p-type AlGaN clad layer. The epitaxial structures were grown by low pressure metalorganic chemical vapor deposition (MOCVD) on high-quality AlN/sapphire templates and a pulsed ArF excimer laser was used as the excitation source for lasing experiments. The threshold power density (Pth) was measured to be 970 kW/cm2 and the SE was strongly polarized in transverse electric (TE) mode. The minimum emission linewidth was ∼2 nm. The high value of Pth is primarily attributed to optical losses due to pump laser absorption in the top p-AlGaN. Our results show the viability of the MOCVD growth technology in conjunction with c-plane sapphire substrates to develop electrically-pumped deep-UV laser diodes.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
