Abstract
A model of the source of monochromatic radiation with λ ~ 13.4 nm with a high conversion factor, intended for industrial nanolithography, is presented. The source is based on an x-ray laser (XRL) on the transition 4f5/2 [J = 1] − 4d3/2[J = 1] of Ni-like tin ions (Sn22+) in plasma formed during the interaction of a nanostructured tin target with an intense ultrashort pump laser (Ipump ~ 8·1017 W cm−2). The inversion mechanism of the optically self-pumped laser is caused by photon reabsorption in optically dense plasma. Calculations of gains and quantum efficiencies of the XRL in Sn22+ with λ ~ 13.4 nm under optimal plasma conditions are discussed.
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