Abstract
In the field of optical telecommunication, polymers are an interesting class of materials for the fabrication of passive optical devices. Electron beam (EB) irradiation appears as a promising method to achieve structures presenting a layer with a modified index of refraction, and therefore to generate optical waveguiding. The poly(diethylene glycol bis(allyl carbonate)) studied here fulfils the requirements of high transparency and is consequently widely used by the optical industry. A scanning electron microscope delivers the EB with a highest energy of 30 keV. The electrons induce an increase of the substrate refractive index (≥8×10 −3 for an electronic fluence ≥5×10 14 e/cm 2) on a thickness corresponding to the penetration depth of the electrons in the material (≤10 μm for a 25 keV EB). Some optical characteristics are presented such as, the surface refractive index, the effective indices and, therefore, the index profile of the waveguides.
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