Abstract
A description is given of an optical system for laser pantography and the results are reported of a surface treatment of semiconductor wafers. The width of microchannels formed by thermal processing reached 2 μm.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
