Abstract

An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.

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