Abstract
In this study, selective optical properties of Si/SiO2 thin films and their dependence on heat treatment were investigated. Samples were synthesized by pulsed-laser ablation deposition of c-Si on glass substrates and annealed at different temperatures (400 °C, 1000 °C). Nanofabrication parameters were chosen to produce significantly different nanostructures ranging from agglomerated particles to nanofibers. Morphology, crystalline, and elemental characterization techniques were employed to explore the variations in visible range reflection measurements. The adverse effect of annealing temperatures on Vis-range reflection spectra to increase and decrease the intensity was confirmed. These improvements are attributed to crystalline and amorphous lattice structures and elemental composition supported by the X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) method results.
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