Abstract
In this study, nickel (Ni) thin films were deposited at two different angles (65o and 85o) using Glancing Angle Deposition technique, to the thicknesses of 60 - 290 nm. Structural analysis of the deposited films was performed by scanning electron microscopy and X-ray diffraction, while spectroscopic ellipsometry was used for the investigation of optical properties. Electrical resitivity of the samples was determined by four-point probe method. Structural analysis showed that the Ni films grow in a shape of zigzag nanocolumns, where the deposition angle strongly affects their porosity. As the thickness of the films increase they absorb light strongly and become less dense. Besides, samples deposited at the angle of 85o exhibit higher values of electrical resistivity as compared to the samples deposited at the angle of 65o, which can be correlated with high porosity and the growth mechanism of the deposited nanostructures.
Highlights
Owing to its specific properties, nanostructured nickel (Ni) thin films obtained by Glancing Angle Deposition (GLAD) technique found a wide application in different technological fields
We present the study of structural and optical properties of nanostructured Ni thin films consisting of zigzag nanocolumns
Cross-sectional Scanning electron microscopy (SEM) analysis was used for the inspection of the structure of deposited Ni films as well as measuring their thickness and diameter of the columns
Summary
Owing to its specific properties, nanostructured nickel (Ni) thin films obtained by Glancing Angle Deposition (GLAD) technique found a wide application in different technological fields. Spectroscopic ellipsometry, as surface-sensitive technique, is widely used for observation and control of optical properties of thin films [13, 14] This non-destructive method measures change in polarization state of light after reflection from the sample surface [15]. The obtained results indicate that the variation of optical and electrical properties could be related to the structural properties of the deposited thin films In this way, the optical quality of the Ni samples might be controlled and modified only by managing thin film thickness and porosity
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