Optical properties of tungsten and titanium oxide thin films prepared by plasma sputter deposition

Abstract

Tungsten oxide and titanium oxide thin films were prepared by RF reactive magnetron sputter deposition. The stationary and rotating substrate holders were applied to analyze the rotating effect. The optical properties and thicknesses of oxide films were determined by a proposed optical model and the measured transmittance spectra. The dispersed refractive indices of thin films have a wide range distribution in different sputtering conditions. In the situation of rotating substrate holder, the refractive index was lower than that of the stationary substrate holder. Also, amorphous TiO2 structure can be prepared by using rotating substrate holder. The transmittance spectrum of crystalline TiO2 reveals that the textured structure on the film surface affects the transmittance characteristic.