Abstract
Thin films of Al2O3 with embedded Cu and Ag nanoparticles (NPs) are deposited by r.f. co-sputtering on glass substrates. The samples are annealed at 400°C and 500°C for 3 h in forming gas (N2+5% H2) to stimulate Cu and Ag nanoclusters' formation. Multilayer structures (stacks) such as Al2O3/Ag/Al2O3, ZnO:Al/Ag/ZnO:Al and Ag/ZnO:Al/Ag/ZnO:Al are deposited on glass substrate by consequently sputtering of the individual layers. Before deposition of the capping layers of Al2O3 and ZnO:Al, the bi-layer structures are annealed in vacuum for 50 min at 220°C or 400°C in the case of glass/Al2O3/Ag, and at 220°C in the case of glass/ ZnO:Al/Ag and glass/ Ag/ZnO:Al/Ag. The diffuse and specular reflectance and transmittance spectra are measured in the spectral range of 300–1200 nm to study the plasma resonance of Cu and Ag nanoparticles. The optical properties of the films and the stack structures are discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
