Abstract
This paper discusses how the optical properties of Ta2O5 films are affected by the conditions under which they are produced by reactive magnetron sputtering of a Ta target with either direct current or ultrasound-frequency alternating current. The dispersion dependences of the refractive and absorption indices, as well as the growth rate of the films, are computed. The effect of currents in the magnetron-discharge plasma on the optical properties of the films is investigated.
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