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Abstract
In the current study, two-dimensional pyrite thin films were produced on various substrates using a plasma-assisted, radio frequency (RF)-powered sputtering process. The photosensitivity of pyrite thin films with varying thicknesses was investigated. The sputtering process was carried out at room temperature under argon gas flow. The pressure was maintained at 3 mTorrs, and the RF power was held at 70 watts. The thickness was adjusted by changing the sputtering time from 20 to 90 minutes. The purpose of this work was to investigate the suitability of these films for use in photovoltaic applications. The growth rate, film thickness, and behaviour of as-grown pyrite thin films were analyzed using various characterization techniques. These films displayed favourable absorption in the UV/Vis range.
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