Abstract
Thin polymer films were deposited in an r.f. discharge of organic vapour (hexamethyldisiloxane (HMDSO)) in the pressure range 0.06–0.5 mbar. Plasma chemical gas conversion influences the deposition process and film properties, thereby producing a refractive index gradient in plasma polymer films. The relationship between the gas composition of the plasma and the changes of resultant film properties was in situ analysed by means of mass spectrometry and single-wavelength ellipsometry.The refractive index of the silicon—organic polymer films varies from 1.45 to above 2.0 over a thickness range of about 200 nm owing to changes in the molecular structure. The dispersion behaviour of HMDSO plasma polymer films and the depth profile of the refractive index were investigated by means of spectroscopic ellipsometry (300–800 nm). Additional investigations of the films confirm a change of film composition.
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