Abstract
Abstract Highly transparent nano-crystalline diamond films with even grain size of 20 nm have been successfully prepared on silicon substrates by microwave plasma enhanced chemical vapor deposition (MPECVD) technique using a gas mixture of nitrogen–methane–hydrogen. It is found that the grown nano-crystalline films have very smooth surface and low surface roughness of 6 nm. Since the low surface roughness, the free-standing nano-crystalline diamond films have high optical transmittance of ∼70% from 300 to 900 nm, about 5% higher than that of free-standing sub-micro-crystalline diamond and 10% higher than that of free-standing micro-crystalline diamond, indicating unique optical properties.
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