Optical properties of InN studied by spectroscopic ellipsometry**Project supported by the State Key Development Program for Basic Research of China (No. 2012CB619301), the National High Technology Research and Development Program of China (No. 2014AA032608), the National Natural Science Foundation of China (Nos. 11204254, 11404271), and the Fundamental Research Funds for the Central Universities (Nos. 2012121014, 20720150027).

Abstract

With recently developed InN epitaxy via a controlling In bilayer, spectroscopic ellipsometry (SE) measurements had been carried out on the grown InN and the measured ellipsometric spectra were fitted with the Delta Psi2 software by using a suitable model and the dispersion rule. The thickness was measured by a scanning electron microscope (SEM). Insight into the film quality of InN and the lattice constant were gained by X-ray diffraction (XRD). By fitting the SE, the thickness of the InN film is consistent with that obtained by SEM cross-sectional thickness measurement. The optical bandgap of InN was put forward to be 1.05 eV, which conforms to the experimental results measured by the absorption spectrum and cathodoluminescence (CL). The refractive index and the extinction coefficient of interest were represented for InN, which is useful to design optoelectronic devices.