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Abstract
ZnO:Gd films with (100) preferred orientation were deposited on glass substrates by reactive radio frequency magnetron sputtering with the deposition temperature of 100–500°C. The (100) texture of the ZnO:Gd film is enhanced with the increase of deposition temperature. The average transmittance of the ZnO:Gd films in the visible region is over 83% and the film deposited at 500°C exhibits the highest transmittance (90%). The optical band gap of the ZnO:Gd films increases from 3.213 to 3.227eV as the deposition temperature increases. The structural defects induced by Gd doping lead to the weak band gap related emission and the strong defects related emissions of the films.
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