Abstract
The optical properties of SiO x films of variable composition obtained by reactive r.f. sputtering of silicon were investigated. The experimental results show that the films have a single-phase structure consisting of a continuous random network with a dominance of six-membered molecular rings of Si-(Si y O 4- y tetrahedra, where 0⩽ y⩽4, joined together by bridging oxygen atoms. The difference between the films investigated and those obtained by vacuum evaporation is determined by the dominance of four-membered rings in the evaporated films. Analysis of the IR spectra reveals that the shift in the absorption band with varying structure is connected with a variation in the central force constant.
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