Abstract
We have made a systematic study of the dependence of hydrogen concentration and optical properties on the deposition parameters for amorphous silicon prepared by r.f. glow discharge decomposition of silane. The hydrogen content and the optical gap decrease with increasing deposition temperature T s, but we also found that the application of an electrical bias to the substrate results in a large increase of the hydrogen content. The rate of increase of the optical gap with the hydrogen content varies with the deposition conditions. This is interpreted as the result of different modes of incorporation of the hydrogen in the material.
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