Abstract
ion beam and examined with near-field techniques. The patterns have been characterized with atomicforce microscopy and scanning near-field optical microscopy to reveal local topography and optical absorptionchangesasaresultofthefocusedhigh-energyionbeaminducedmodification. Apartofaconsiderablethicknesschange (thinning tendency), which has been observed in the ion-irradiated areas, the near-field measurementsconfirm increases of optical absorption in these areas. Although the size of the fabricated optical patterns is inthemicron-scale, thepresentdevelopmentofthetechniqueallowsinprinciplewritingopticalpatternsuptothenanoscale (several tens of nanometers). The observed values of the optical contrast modulation are sufficient tojustifytheefficiencyofthemethodforopticaldatarecordingusinghigh-energyfocusedionbeams.PACS:41.75.Ak,42.70.Ln,68.37.Uv,73.61.Jc
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