Optical near-field and thermal nanolithography using organic dry developingphotoresist

Abstract

A combination of new organic photoresist films based on naphthoquinone with aconventional AFM using a tapered fibre tip as a near-field source enables the developmentof ‘real time’ dry process nano-lithography. The methodology of the adaptation of thesefilms as well as the system configuration for a nano-scale fabrication will be described.Using these materials the exposure can be performed either by the optical near field ornano-thermal effect to achieve positive or negative lithography. Sub-wavelength gratingsfabricated using this system with a variable line width down to 45 nm will be demonstrated.