Optical, Mechanical, and Thermal Properties of Free-Standing MoSi2Nx and ZrSi2Ny Nanocomposite Films

Abstract

The optical, mechanical, and thermal properties of free-standing structures based on nitrided molybdenum and zirconium silicides have been studied. It has been shown that silicide nitriding considerably improves the thermal stability of films. While as-prepared amorphous MoSi2 and ZrSi2 films crystallize in the interval 330–370°C, nitriding of films has made it possible to increase their working temperatures in vacuum to 600–700°C (at least, for x ≥ 0.25, y ≥ 1.3). Tensile tests have shown that the ultimate strength of MoSi2Nx films (0 ≤ x ≤ 0.55) depends on nitrogen content only slightly. Comparison between the properties of MoSi2Nx and ZrSi2Ny films magnetron-sputtered at the same partial pressure of nitrogen has demonstrated that with transmission coefficients of films at a wavelength of 13.5 nm being close to each other, ZrSi2 films are more effective as protection coatings (they are less prone to oxidation and more degradation-resistant).