Abstract
The krypton fluoride excimer laser has provided a means of exploiting the deep‐ultraviolet for optical lithography. The use of this new light source requires the development of new photoresists and opens up a new set of concerns for the lithographer. Durability of lenses, coatings, and photomask materials are potential problems because of the very high peak power emitted by the pulsed laser. Optical interference effects, caused by the coherence of the laser light, could also cause trouble. Finally, the laser itself has high requirements for reliability and safety.
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