Optical examination of high contrast grating fabricated by focused-ion beam etching

Dominika Urbańczyk,Jan Muszalski,Adam Łaszcz,Anna Wójcik-Jedlińska,Tomasz Czyszanowski,Andrzej Czerwinski,Marcin Gębski,Mariusz Płuska,Maciej Bugajski

doi:10.1007/s11082-016-0544-8

Abstract

High refractive index contrast gratings (HCGs) with their extraordinary optical properties are very interesting candidates to substitute Distributed Bragg Reflectors as mirrors in optoelectronic semiconductor devices. In this work we present results of optical examination of a large scale HCG structure fabricated by focused-ion beam etching technique. The measured reflectance spectra exhibit a strong dependence on polarization of incident light, which confirms theoretical predictions. We also studied optical properties of a cavity formed by the HCG stacked on a wafer containing a VECSEL-like epitaxial structure.

Highlights

Nowadays, distributed Bragg reflectors (DBRs) are in widespread use in technology of surface-normal emitting lasers like VCSELs and VECSELs Calvez et al (2009)
In this work we present results of optical examination of a large scale High refractive index contrast gratings (HCGs) structure fabricated by focused-ion beam etching technique
In this work HCG mirrors fabricated by Focused Ion Beam (FIB) etching were characterized by means of micro-reflectance measurements

Summary

Introduction

Nowadays, distributed Bragg reflectors (DBRs) are in widespread use in technology of surface-normal emitting lasers like VCSELs and VECSELs Calvez et al (2009). Despite very high reflectivity of such kind of mirrors, we must be aware of their limitations. The. This article is part of the Topical Collection on TERA-MIR: Materials, Generation, Detection and Applications.

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