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Abstract
A magnetron sputter ion plating (MSIP) 13.56 MHz r.f. discharge for titanium nitride (TiN) deposition on thermoplastic polymers was studied by means of optical emission spectroscopy (OES). In this work poly(butylene terephthalate) (PBT) and poly(amide)6.6 (PA) were chosen as substrate materials. Argon sputter etch depth profiling and investigation of the chemical composition by means of X-ray photoelectron spectroscopy (XPS) showed high amounts of oxygen in the films. To determine the source of the oxygen, OES was used to analyze the plasma and to study its spatial and temporal behavior under different sputtering conditions. Results show that a small amount of water, which is always present in the reactor, is one reason for the high oxygen content of the deposited films. The main cause however is water vapor released from the polymer, which is promoted by substrate heating during the coating process. The OES results suggest certain chemical reactions to take place in the plasma, which can be correlated to the chemical composition of the films.
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