Abstract
In this paper, a diagnostic tool for magnetron sputtering deposition of copper oxides is presented. The copper oxide thin films were deposited in DC-MF mode for various argon/oxygen mixtures, including deposition in a pure oxygen atmosphere (fully reactive mode). The copper oxides were deposited on quartz glass substrates and carbon foils. The deposition process was monitored using optical emission spectroscopy. The films were further analysed by X-ray diffraction (XRD), optical measurements, and Rutherford backscattering spectroscopy (RBS). The obtained results confirmed that optical emission spectroscopy (OES) can be used as a diagnostic tool for magnetron sputtering technology that enables control of the sputtering mode, and therefore, the deposition of pure metallic (Cu) and various oxide (Cu2O, CuO) films can be performed. The results show that by increasing oxygen content in the argon/oxygen mixture, the sputtering rate is reduced; however, in the oxygen, at 40–100% range, it is stabilised at 12 nm/min.
Highlights
Magnetron sputtering technology is commonly used for the deposition of a wide range of materials with specific optical and electrical properties for various applications
Salhi et al [3] have reported the sputter deposition of Ti and Ni thin films in radio frequency magnetron sputtering controlled by optical emission spectroscopy
For the Rutherford backscattering spectroscopy (RBS) experiments, the thickness was reduced to 80–160 nm and the thin films were deposited onto C foils keeping the same deposition procedures as for films deposited on quartz glass substrates (Table 1)
Summary
Magnetron sputtering technology is commonly used for the deposition of a wide range of materials with specific optical and electrical properties for various applications. The magnetron sputtering technology is widely used for thin films of gas-sensing layer deposition [7,8,9,10] in metal oxides such as ZnO [11], SnO2 [12], TiO2 [13], WO3 [14] and CuO [15] and many others [16,17,18,19,20]. The optical diagnostic method—optical emission spectroscopy for the magnetron sputtering process of the copper oxide at various argon/oxygen ratios— is demonstrated and discussed. The copper oxide thin films can be used in many varied applications; the main goal was to develop a diagnostic method for CuO deposition for gas-sensing devices and optical applications
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