Optical Design of a High Flux Setup in the Extreme Ultraviolet

Abstract

Extreme ultraviolet (XUV) light applications are still a very promising field that was heavily enlivened by the definition of the new wavelength for semiconductor lithography within the XUV range. But the detection of XUV light is also important for the exploration in the field of space science (i.e., monitoring the formation and evolution of solar storms) and high-energy physics (i.e., dark matter detection). The advancement of this technology mainly depends on the performance optimization of XUV sources, optical systems and related photodetectors. In this work, the optical design of a high flux XUV setup was simulated and defined to optimise the beam path which is the backbone of the initial evaluation process for the characterisation of luminescent materials under XUV irradiation. Additionally, the paper focused on the conceptualisation and realisation of the experimental setup as well as the alignment of the optical components and the detector calibration.