Abstract
An echelette grating is fabricated on a silicon surface by anisotropic etching. A five channel demultiplexer using this grating for a wavelength-division-multiplexing system is developed in the 0.8-μm wavelength region. The wavelength spacings are 250 A. This system's insertion loss for five channels is 1.4, 1.1, 1.1, 1.1, and 1.2 dB, respectively, and crosstalk levels are <-30 dB.
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