Abstract
The large field of view involved in voltage contrast electron beam opens and shorts testing of packaging substrates results in unique electron optics requirements. These are long working distance, small beam diameter and high beam currents. Beam energies required for this application range from 3 to 10 keV. An optics system consisting of a Steigerwald electron gun and a magnetic lens with appropriate beam aperturing was designed. The Steigerwald gun has an integral immersion lens which produces a collimated beam with low divergence angle. Virtual crossover size of this source was estimated to be about 0.1 μm. The column was built and tested. The column produced 200 nA into a 10 μm beam spot diameter at a working distance of 20 cm operating at 10 keV. Improved performance of the present design is predicted for a brighter electron source operating at lower temperatures than tungsten filament.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
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