Abstract
We report the optical characterization of a metal wiregrid micropolarizer array for IR imaging polarimetry. The micropolarizers are designed for operation in the 1.5-5.0 microm band with a specially designed thin SiO(2) layer between the silicon substrate and the wiregrids to improve the performance at the shorter wavelengths. Deep-UV projection lithography is used to fabricate 140-nm-deep wiregrids with a 400 nm period. The extinction ratio and the transmission coefficient are measured with a tunable IR laser. A TM transmission coefficient greater than 70% with an extinction ratio greater than 10(4) is achieved for the midwave-IR region while maintaining an extinction ratio better than 10(2) for the near-IR region above 1.5 microm.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
