Optical Characterization of 4H-SiC Thick Epitaxial Layer for Particle Detection

Abstract

In the present work a deep characterization of 4H-SiC epi-layer was done. A thick layer was epitaxially grown through chemical vapor deposition (CVD) process in a horizontal hot-wall reactor in order to obtain a 250 microns thick epi-layer. This sample will be used as particle detector in hostile environments such as neutron detection in a nuclear fusion reactor. Raman and Photoluminescence (PL) spectroscopy have been used in order to evaluate the general status of epitaxy and, with the support of the Time Resolved Photoluminescence, also important properties such as carrier lifetime and diffusion length have been evaluated. Carrier lifetime evaluation before and after a thermal oxidation process at 1400° C for 48h was estimated, by considering a lifetime increment after oxidation process, due to the decrease of carbon vacancies. Finally, the influence of stacking fault (SF) defects on carrier lifetime was evaluated observing a decrease of the lifetime for the defects at 430 nm (2.88 eV) for both oxidated and non-oxidated samples.