Abstract
Abstract Material properties and surface morphology of nanostructures have impact on optical characteristics of nanostructures. More and more arrays of nanostructures are investigated to regulate and control surface radiation characteristics. However, the majority of the object surfaces are random rough surfaces in daily life, the radiation characteristics of which are widely used in various fields including remote sensing, photovoltaic utilization and thermal control. Therefore, the radiation characteristics of random rough surfaces are important for both academic research and practical applications. In this paper, a recombination random nanostructure consisting of conical structures and nanopores based on silicon substrate was prepared by plasma etching and chemical corrosion. The three-dimensional coordinate data of the recombination structure surface are obtained by atomic force microscopy, the radiation characteristics of the recombination random nanostructure is investigated by numerical calculation and experimental measurement, which has excellent antireflection characteristics over 300nm-1100nm. The influence of the incident angle and polarization state on the radiation characteristics are analysed.
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