Optical and Recombination Parameters of CdS1−xTex Thin Films Obtained by the CMBD Method

Takhir M Razykov,Diyorbek Isaqov,Mirosław Maliński,Bobur Ergashev,Akbarjon Shukurov,Mirzavkiy Makhmudov,Aleksy Patryn,Leszek Bychto,Kudratulia Kouchkarov

doi:10.3390/coatings12010005

Takhir M Razykov, Diyorbek Isaqov + Show 7 more

Open Access

https://doi.org/10.3390/coatings12010005

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Abstract

This paper presents the results of the photoacoustic, SEM, and surface photovoltage experiments performed on the series of CdS1−xTex thin films. These CdS1−xTex (0 ≤ x ≤ 1) thin films were obtained on the glass substrate by the chemical molecular beam deposition (CMBD) method. The polycrystalline character of these films was revealed by SEM pictures. From the experimental optical characteristics, the optical absorption coefficient spectra of the samples and values of their energy gaps vs. their composition were determined. From the surface photovoltage characteristics, the diffusion lengths of the carriers were also determined.

Highlights

The growing demand for thin-film solar cells and optoelectronic devices requires that they become cheaper, better quality, and more efficient [1–3]
The chemical molecular beam deposition (CMBD) method has a number of advantages, such as
The deposition process is controlled at the molecular level (1010–1014 cm−2), which allows controlling the composition of the films accurately

Summary

Introduction

The growing demand for thin-film solar cells and optoelectronic devices requires that they become cheaper, better quality, and more efficient [1–3]. Various physical and chemical methods are used to obtain the main semiconductor polycrystalline layer in thin-film optoelectronic devices, such as photoresistors, photodiodes, transistors, etc. These methods use expensive vacuum devices and complex chemical processes to produce a semiconductor polycrystalline layer. Our chemical molecular beam deposition (CMBD) method avoids these processes and is simple [12].

Results

Conclusion