Abstract
Graphene films have been produced by electrospraying on SiO2-coated silicon substrate and subsequent heat treatment, offering a simple and typical method to produce porous graphene films and exhibiting a good adhesion to silicon substrate. The microstructures of as-prepared graphene films were characterized by field emission scanning electron microscopy, transmission electron microscopy, selected area electron diffraction and atomic force microscopy. X-ray photoelectron spectroscopy, infrared spectroscopy and Raman spectroscopy further confirmed the formation of porous graphene films. Moreover, the reflection spectrum of as-prepared graphene films was studied by ultraviolet–visible spectroscopy, revealing that light absorption played dominant roles at 375 and 635nm, respectively. Finally, the resistance and magnetoresistance were measured, and some preliminary theoretical explanations were proposed.
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