Optical and Electronic Properties of Symmetric InAs/(In,Al,Ga)As/InP Quantum Dots Formed by Ripening in Molecular Beam Epitaxy: A Potential System for Broad-Range Single-Photon Telecom Emitters

Abstract

We present a detailed experimental optical study supported by theoretical modeling of $\mathrm{In}\mathrm{As}$ quantum dots (QDs) embedded in an $(\mathrm{In},\phantom{\rule{-1.5pt}{0ex}}\mathrm{Al},\phantom{\rule{-1.5pt}{0ex}}\mathrm{Ga})\mathrm{As}$ barrier lattice matched to $\mathrm{In}\mathrm{P}$(001) grown with the use of a ripening step in molecular beam epitaxy. The method leads to the growth of in-plane symmetric QDs of low surface density, characterized by a multimodal size distribution resulting in a spectrally broad emission in the range of $1.4$--$2.0\phantom{\rule{0.2em}{0ex}}\ensuremath{\mu}\mathrm{m}$, essential for many near-infrared photonic applications. We find that, in contrast to the $\mathrm{In}\mathrm{As}$/$\mathrm{In}\mathrm{P}$ system, the multimodal distribution results here from a two-monolayer difference in QD height between consecutive families of dots. This may stem from the long-range ordering in the quaternary barrier alloy that stabilizes QD nucleation. Measuring the photoluminescence (PL) lifetime of the spectrally broad emission, we find a nearly dispersionless value of $1.3\ifmmode\pm\else\textpm\fi{}0.3$ ns. Finally, we examine the temperature dependence of emission characteristics. We underline the impact of localized states in the wetting layer playing the role of carrier reservoir during thermal carrier redistribution. We determine the hole escape to the $(\mathrm{In},\phantom{\rule{-1.5pt}{0ex}}\mathrm{Al},\phantom{\rule{-1.5pt}{0ex}}\mathrm{Ga})\mathrm{As}$ barrier to be a primary PL quenching mechanism in these QDs.