Abstract
The effects of deposition conditions, including substrate temperature and sputtering gas pressure; on the optical and electrochromic (EC) properties of WO 3 films prepared by RF reactive sputtering were investigated. The maximum optical bandgap energy of 3.15 eV was obtained on a room temperature substrate, and decreased with increasing substrate temperature. However, the maximum refractive index of about 2.5 was obtained at a sputtering gas pressure of 5 mTorr and a substrate temperature of 500 °C, and decreased with decreasing substrate temperature and with increasing pressure. The decrease in bandgap energy and refractive index are thought to have been caused by an increase in WO 3 cluster size and a decrease in film density, respectively. Electrochromic (EC) response times of the WO 3 films were measured in an electrolyte of 1 N H 2SO 4 aqueous solution. Fast EC responses were obtained for the WO 3 films with wide bandgap energies and low refractive indices. The results indicate that the optical properties of WO 3 films are useful indicators of EC response.
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