Abstract
Gold- and palladium-doped tungsten oxide thin films were prepared by RF reactive sputtering in a mixture of argon and oxygen at room temperature and optical properties and electrochromic characteristics of the films were investigated. XRD patterns indicated that the films were amorphous. SEM imaging indicated that the grain size of gold- and palladium- doped thin films was smaller than that of the non- doped tungsten oxide thin films. By gold and palladium doping, the current- voltage characteristics show a significant change, even in the a bsorption of the film wearing the color reaction consumption, resulted in major changes.
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