Optical Absorption Measurements of Sputtered Ti Ion Density and Discussion of Ionization Mechanisms in Inductively Coupled Plasma-Assisted DC Sputtering

Abstract

This study discusses the ionization mechanisms of sputtered titanium (Ti) in inductively coupled plasma (ICP)-assisted dc magnetron sputtering based on measurements and model analyses. Ionic and atomic densities of sputtered titanium were measured using an optical absorption method under an Ar pressure of 3.5 Pa against rf(13.56MHz) power applied to the inserted coil. A Langmuir probe provided measurements of electron densities against coil rf power, giving input parameters for model analyses. We adopted a model analysis method presented by J. Hopwood and F. Qian [J. Appl. Phys. 78, 758 (1995)]. Variations of ionic and atomic densities and ionization fractions against electron density from model calculation agreed with those obtained by measurements. The results showed clearly that electron impact ionization dominates ionization of sputtered titanium in high er electron density regions compared to Penning ionization through Ar metastable atoms. Penning ionization played an important role at the lower electron density region because of the longer time for radiative decay of Ar metastable atoms.