Abstract
The digital electrostatically focused e-beam array direct-write lithography (DEAL) concept is currently under development at Oak Ridge National Laboratory (ORNL) . This concept incorporates a digitally addressable field-emission array (DAFEA) employing electrostatic focusing with an integrated dose control circuit to function as the write head for an e-beam lithography tool. Electron beams from each emitter cathode are individually addressable, thus enabling parallel patterning of a target substrate by multiple electron sources.
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