Abstract
AbstractAn onion maggot, Hylemya antiqua (Meigen) (Diptera: Anthomyiidae) strain, having low level (≤ × 5) resistance to organophosphorus insecticides, was selected with parathion to determine if higher resistance levels to the selection agent and other insecticides used for onion maggot control would result. Parathion resistance levels increased to ×10.1 and ×23.8 after 4 and 14 generations of selection, respectively; without further selection, resistance levels declined by ca. 1/2 in 6–7 generations. Parathion resistance was ×24.4 after 20 generations of selection and resistance levels to ethion, diazinon, fonofos, and carbofuran were 2 to 3 times higher than those measured initially. The pattern of resistance development in field strains of onion maggot collected in 1975 and 1980 was similar to that observed in the laboratory selection program, but resistance levels were lower, probably because of lower selection pressure and the variety of chemicals used under practical conditions. After 14 generations of parathion selection, resistance levels were ×23.8 and ×10.1 to parathion and carbofuran, respectively. After 12 additional generations of carbofuran selection, carbofuran resistance increased to ×31.2, while the level of parathion resistance remained the same.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
