One step ‘dip’ and ‘use’ Ag nanostructured thin films for ultrahigh sensitive SERS Detection

Abstract

A simple one step galvanic displacement method which involves dipping of the silicon substrate in the AgNO3/HF solution and using it for SERS application without any further process is demonstrated. The size and shape of the Ag nanoparticles changes as the deposition time is increased. Initially the shape of the particles was nearly spherical and as it grows, becomes oblong and then coalesce to form a discontinuous film with vertically grown hierarchical Ag nanostructures. The sizes of the deposited particles were in the ranges from 30nm to a discontinuous film. It also demonstrated a highly sensitive chemical detection by surface-enhanced Raman scattering of rhodamine 6G dye, down to 10−16M concentration. Prepared samples were able to detect lower concentrations of Melamine. Discontinuous thin films with hierarchical Ag nanostructures were obtained for 5min Ag deposition. The formation of Hot spots between the discontinuous islands and also along the hierarchical structures is responsible for the high SERS enhancement. This simple one step, fast, non-lithographic and cost effective method can be applied for various label free detection of analytes of importance.