Abstract
A two-dimensional (2D) nanopositioning platform stage (NanoPla) is in development at the University of Zaragoza. To provide a long travel range, the actuators of the NanoPla are four Halbach linear motors. These motors present many advantages in precision engineering, and they are custom made for this application. In this work, a one-dimensional (1D) control strategy for positioning a Halbach linear motor has been developed, implemented, and experimentally validated. The chosen control hardware is a commercial Digital Motor Control (DMC) Kit from Texas Instruments that has been designed to control the torque or the rotational speed of rotative motors. Using a commercial control hardware facilitates the applicability of the developed control system. Nevertheless, it constrains the design, which needs to be adapted to the hardware and optimized. Firstly, a dynamic characterization of the linear motor has been performed. By leveraging the dynamic properties of the motor, a sensorless controller is proposed. Then, a closed-loop control strategy is developed. Finally, this control strategy is implemented in the control hardware. It was verified that the control system achieves the working requirements of the NanoPla. It is able to work in a range of 50 mm and perform a minimum incremental motion of 1 μm.
Highlights
Positioning stages are becoming fundamental devices in nanotechnology and nanomanufacturing processes [1,2], where they act as a supplementary unit for measuring or manipulating samples [3,4]
This paper proposes the use of a generic Digital Motor Control (DMC) Kit from Texas Instruments
The aim of the experiments is to confirm that the 1D control system fulfils the working conditions
Summary
Positioning stages are becoming fundamental devices in nanotechnology and nanomanufacturing processes [1,2], where they act as a supplementary unit for measuring or manipulating samples [3,4]. Several metrological systems are currently available [6,7,8] These systems have been designed for demanding and accurate operations. Their measuring and positioning range is often very limited [9,10]. Other applications such as measuring or manipulating solar cells or silicon wafers require working with larger areas in a planar part, where cutting of specific samples may be necessary. The nanotechnology industry is demanding more accurate positioning systems and larger working ranges [11] Within this line of research, a nanopositioning platform stage (NanoPla) has been developed and manufactured at the University of Zaragoza [12,13]. Its first application integrates an atomic force microscope (AFM) as a suitable technique for micro- and nanometrology [14], due to the high vertical as well as lateral resolution in the topographic characterization task of specimens
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