Abstract

In this paper, a novel method is proposed fur building future nanoelectronic on-chip interconnects and repeaters using the newly invented nickel silicide (NiSi) nanowires. NiSi nanowires not only offer supreme interconnect performances but also open up the possibility of integrating both active devices and high-performance interconnects in a single nanoscale building block. Thus, it is particularly useful in the integration of interconnects and repeaters. The analyses show that this interconnect/repeater solution will operate in higher speed, compared with copper and carbon nanotube. This new interconnect/repeater technology is very promising for next-generation of nanoscale ICs

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