On thermal stability and oxidation behavior of metastable W–Zr thin-film alloys

Abstract

The thermal stability and oxidation behavior of metastable W–Zr thin-film alloys with up to 83 at.% Zr were thoroughly investigated with a focus on the effect of gradual substitution of Zr for W. The films were prepared by dc magnetron co-sputtering of W and Zr targets in argon on unheated and unbiased substrates. The experiments showed that a supersaturated α-W(Zr) solid solution structure of as-deposited W-rich films with up to 19 at.% Zr is highly thermally stable up to 1200 °C in argon and the thermal stability of the W–Zr thin-film metallic glasses (33–83 at.% Zr) decreases with increasing Zr content. Nevertheless, the thermal stability of the W–Zr thin-film metallic glass with 33 at.% Zr reaches 1420 °C, which is very high value for binary metallic glass. The annealing of W-rich films (0–24 at.% Zr) in air leads to the formation of a protective surface oxide layer, which serves as a more effective oxygen diffusion barrier due to an increasing packing factor and amorphization with Zr addition. On the other hand, no protective surface oxide layer is grown during the annealing in air in the case of the W–Zr thin-film metallic glasses and the oxidation leads to the formation of compact, homogeneously oxidized substoichiometric W–Zr–O films with an amorphous structure and enhanced mechanical properties before reaching the final mass gain.