Abstract
Thin films of the ternary system TiAlN, produced by PVD magnetron sputtering, show excellent wear-resistance and microhardness. It could be proved that a composition of the form (Ti, Al)N grows up a TiN lattice. Up in a 30 at.% aluminium can be solved in this lattice with decreasing lattice parameters. The ternary H-phase Ti 2AlN has not been deposited as the deposition temperatures are too low.
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