Abstract
Ni-S electrodeposits have been produced by two plating methods, direct current (dc) and pulse current (pc) methods, in a nickel sulfate bath. The structure of electrodeposited layers has been studied in detail by X-ray diffraction methods. The electro-deposited layer produced by the dc method contains 21 at% S and consists of a microcrystalline state of Ni alloy. However, the layer by the pc method contains 46 at% S and consists of an amorphous alloy.
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