Abstract

Photoelectron spectroscopy was combined with ab initio calculations to elucidate the structure and bonding in Si6 2- and NaSi6 -. Well-resolved electronic transitions were observed in the photoelectron spectra of Si6 - and NaSi6 - at three photon energies (355, 266, and 193 nm). The spectra of NaSi6 - were observed to be similar to those of Si6 - except that the electron binding energies of the former are lower, suggesting that the Si6 motif in NaSi6 - is structurally and electronically similar to that in Si6 -. The electron affinities of Si6 and NaSi6 were measured fairly accurately to be 2.23+/-0.03 eV and 1.80+/-0.05 eV, respectively. Global minimum structure searches for Si6 2- and NaSi6 - were performed using gradient embedded genetic algorithm followed by B3LYP, MP2, and CCSDT calculations. Vertical electron detachment energies were calculated for the lowest Si6 - and NaSi6 - structures at the CCSD(T)/6-311+G(2df), ROVGF/6-311+G(2df), UOVGF/6-311+G(2d), and time-dependent B3LYP/6-311+G(2df) levels of theory. Experimental vertical detachment energies were used to verify the global minimum structure for NaSi6 -. Though the octahedral Si6 2-, analogous to the closo form of borane B6H6 2-, is the most stable form for the bare hexasilicon dianion, it is not the kernel for the NaSi6 - global minimum. The most stable isomer of NaSi6 - is based on a Si6 2- motif, which is distorted into C2v symmetry similar to the ground state structure of Si6 -. The octahedral Si6 2- coordinated by a Na+ is a low-lying isomer and was also observed experimentally. The chemical bonding in Si6 2- and NaSi6 - was understood using natural bond orbital, molecular orbital, and electron localization function analyses.

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